Nr. 29 - Nanostructured opto-electronic materials

Approved FOM programme

Objectives

The atomic scale synthesis, manipulation, and modification of surfaces and thin films with novel optical, electronic, and opto-electronic applications.

Background, relevance and implementation

Opto-electronic materials are becoming more and more important in present day information technology. In order to achieve the desired properties it is often necessary to manipulate the structure and properties of materials on an atomic scale. The challenge then is to find a relation between structure and electronic and optical properties. This research programme involves the synthesis and characterisation of optically active thin films for applications in integrated optics, silicon based opto-electronic materials, and the study of nanometer sized multilayers for applications in x-ray optics. Ion beams, molecular beam epitaxy, and sputter techniques will be used for materials synthesis.